Plasma-Assisted Atomic Layer Deposition of Al2O3at Room Temperature
نویسندگان
چکیده
منابع مشابه
Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website. • The final author version ...
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• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website. • The final author version ...
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ژورنال
عنوان ژورنال: Plasma Processes and Polymers
سال: 2009
ISSN: 1612-8850
DOI: 10.1002/ppap.200930605